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Spherical Refractory Rhenium Powder is made by Radio Frequency Plasma Spheroidization atomized method, which has high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density.
Order(MOQ) :
1 KgPayment :
T/T ; L/C at sightProduct Origin :
ChinaShipping Port :
Foshan / Guangzhou / ShenzhenLead Time :
1-7 daysStardust company provide spherical refractory rhenium powder with high purity, low oxygen, high sphericity , smooth surface, no satellite spheres, uniform particle size distribution. Metal rhenium silver gray, hard, melting point 3180℃, only lower than the most difficult to melt tungsten. Rhenium has high resistance, good mechanical properties, high temperature resistance, corrosion resistance, used to manufacture electric filament, artificial satellite and rocket shell, atomic reactor protective plate, electrode, thermocouple and so on. Chemically used as a catalyst. Spherical rhenium powder has the characteristics of high purity, few satellites, few hollow particles, excellent flow performance, etc., suitable for 3D printing, hot isostatic pressing, laser cladding, hot/cold spraying and other processes.
We can not only provide relatively mature research on spherical refractory rhenium powder but also provide 3D printing services, metal spheroidization services, 3D printing machines and devices .
5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm.
(Various granularities can be customized according to customer requirements)
High purity (≥99.9%), low oxygen (≤300ppm), high sphericity (≥98%), smooth surface, no satellite spheres, uniform particle size distribution, and excellent flow properties (≤15.0s/50g), And high apparent density (≥4.5g/cm3) and tap density (≥5.5g/cm3).
Vacuum packaging, 1kg/bag, 2kg/bag; iron drum lined with plastic bag 25 kg/drum; special packaging is available according to user requirements.
Chemical Composition | |||||
Element | Value (%) | Test Method | Element | Value (%) | Test Method |
Re | ≥99.99 | — | Other | <0.01 | ICP-AES |
Gas Impurities | |||||
Element | Value (%) | Test Standard | Element | Value (%) | Test Standard |
C | ≤0.005 | GB/T 4324-2012 | O | ≤0.05 | GB/T 4324-2012 |
Density (g/cm3) | Hall Flow Rate (s/50g) | |||
Apparent Density | Tap Density | Test Standard | Value | Test Standard |
≥9.5 | ≥10.8 | GB/T 1479-1984 GB/T 5162-2006 |
≤10.0 | GB/T 1482-2010 |