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Spherical tantalum powder is made by Radio Frequency Plasma Spheroidization atomized method, which has high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density.
Order(MOQ) :
1 kgPayment :
T/T ; L/C at sightProduct Origin :
ChinaShipping Port :
Foshan / Guangzhou / ShenzhenLead Time :
1-7 daysStardust company provide spherical chrome powder with high purity, low oxygen, high sphericity , smooth surface, no satellite spheres, bare hollow particle, uniform particle size distribution, excellent flow properties, and high bulk density and tap density.
Tantalum has excellent biocompatibility. The tantalum implant formed by 3D printing has the elastic modulus closest to human cartilage tissue, making it the most ideal orthopedic implant material.
Spherical molybdenum powder is suitable for laser/electron beam additive manufacturing, hot isostatic pressing, laser cladding, hot/cold coating and other processes.
We can not only provide relatively mature research on pure tantalum spherical powder but also provide 3D printing services, metal spheroidization services, 3D printing machines and devices .
5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm.
(Various granularities can be customized according to customer requirements)
High purity (≥99.98%), low oxygen (≤200ppm), high sphericity (≥98%), smooth surface, no satellite spheres, uniform particle size distribution, and excellent flow properties (≤6.5s/50g), And high bulk density (≥9.5g/cm3) and tap density (≥10.5g/cm3).
Vacuum packaging, 1kg/bag, 2kg/bag; iron drum lined with plastic bag 25 kg/drum; special packaging is available according to user requirements.
| Chemical Composition | |||||
| Element | Value (%) | Test Method | Element | Value (%) | Test Method |
| Ta | ≥99.98 | —— | Ti | ＜0.001 | ICP-AES |
| Fe | ＜0.001 | ICP-AES | Mo | ＜0.005 | ICP-AES |
| Si | ＜0.005 | ICP-AES | W | ＜0.01 | ICP-AES |
| Ni | ＜0.002 | ICP-AES | Nb | ＜0.01 | ICP-AES |
| Gas Impurities | |||||
| Element | Value (%) | Test Standard | Element | Value (%) | Test Standard |
| C | ≤0.003 | GB/T15076.8-2008 | O | ≤0.03 | GB/T15076.14-2008 |
| H | ≤0.0015 | GB/T15076.15-2008 | N | ≤0.004 | GB/T15076.13-2017 |
| Density （g/cm3) | Hall Flow Rate (s/50g) | |||
| Apparent Density | Tap Density | Test Standard | Value | Test Standard |
| ≥9.5 | ≥10.5 | GB/T 1479-1984 GB/T 5162-2006 |
≤6.5 | GB/T 1482-2010 |
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